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6.67nm Extreme Ultraviolet EUV Mirrors
6.67 nm extreme ultraviolet mirrors are high-precision reflectors designed for extreme ultraviolet light. Coligh produces EUV6.67nm, 4.48nm, 13.5nm ultraviolet reflectors
- >35% ultra-high reflectivity
- Ultra-thin multi-layer film
- Customized design
6.67nm Extreme Ultraviolet EUV Mirrors Description
6.67 nm extreme ultraviolet (EUV) reflector (D = 1.4 nm) is a high-precision optical element designed for extreme ultraviolet light or soft X-rays in the 6.67 nm band. Based on ultra-thin multilayer films and customized design, the ultra-thin film thickness of D = 1.4 nm can reduce absorption loss, improve reflectivity, and more accurately match the Bragg reflection conditions of 6.67 nm wavelength, effectively improving reflectivity by more than 35%. We use ALD and IBS synergistic coating to support gradient layer thickness and asymmetric film stack customization.
6.67nm Extreme Ultraviolet EUV Mirrors Detail Display
6.67nm Extreme Ultraviolet EUV Mirrors Technical Datasheet
| Material | Single Crystal Silicon, Silicon Carbide, Ultra-Low Expansion Glass |
| Peak Reflective Wavelength | 6.67nm |
| Peak Reflectivity | >35% |
| Surface Quality | 60/40, 40/20, 20/10, 10/5 |
6.67nm Extreme Ultraviolet EUV Mirrors Applications
6.67nm extreme ultraviolet (EUV) mirrors have important applications in many fields, such as:
- EUV mirrors are used in extreme ultraviolet lithography (EUVL) systems to create very small features, which are used to create fine patterns on semiconductor wafers and produce smaller, faster and more efficient semiconductor devices
- EUV extreme ultraviolet (EUV) mirrors are used to accurately pattern nanoscale structures on substrates. The extremely short wavelength allows high-resolution imaging, which is critical for the production of smaller integrated circuits.
- EUV mirrors can also be used in precise measurement systems to analyze thin films, coatings and other materials.
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