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At the 2025 Semicon China conference, Sicarrier, a Chinese company founded less than 4 years ago, released for the first time 31 optical inspection equipment and optical measurement equipment covering the entire process of semiconductor manufacturing. Sicarrier,focuses on promoting domestic high-end lithography equipment, including lithography, etching, thin film deposition and other technologies.
Sicarrier‘s main businesses include:
Semiconductor equipment and component development: R&D and manufacturing of various semiconductor equipment, such as EPI\PVD\ALD\CVD, etc.
- Electronic manufacturing equipment: such as metal plane film deposition equipment, atomic layer deposition equipment, innovative CVD equipment
- High-end detection instruments: such as optical detection equipment such as BFI\DFI and X-ray detection equipment AFM, XPS, etc.
- These equipment are used in the semiconductor manufacturing process for key links such as defect detection on the wafer surface and film thickness measurement.
Applications of Sicarrier’s equipment on optical filters:
These equipment can better assist the application of optical filters in semiconductor equipment.For example:
- Sicarrier’s thin film deposition series equipment can be used to generate highly conformal dielectric films or metal films. The optical properties of these films (such as transmittance and reflectivity) need to be precisely controlled.
- The core of EUV filters is a precise multilayer film structure (such as molybdenum/silicon alternating layers), which requires atomic-level deposition technology to achieve high-precision film thickness control and interface uniformity.
Sicarrier’s capability on thin film process:
Sicarrier’s ALD and PVD equipment demonstrate the following capabilities in thin film processes:
- ALD equipment: supports high-conformal dielectric film deposition, meets the needs of ultra-thin films and ultra-high aspect ratio gap filling, and is suitable for processes with nano-level precision requirements
- PVD equipment: Excellent performance in metal plane film deposition, high coating uniformity and stability, and may be suitable for metal layer deposition in filters
- EUV filters need to be inspected by high-precision optical inspection to ensure that there are no defects and that the film parameters meet the standards. Sicarrier’s optical measurement equipment and PX measurement products for measuring film thickness and reflectivity have covered categories such as bright field defect detection (BFI) and surface defect detection (PC), and are scheduled to enter mass production in 2025.
What Coligh’s capability on EUV filters?
As a company with EUV filter optical coatings, we congratulate Xinkailai’s products on the epoch-making changes that will be brought to China’s semiconductor products. In the past few years, our company has successfully produced high-quality EUV filters, such as 13.5nm multilayer film reflectors, 193nm 266nm anti-reflection film filters, 4.48nm\6.67nm\13.5nm multilayer film reflectors. Welcome to contact sales support to discuss your project.
