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193nm Deep UV Reflective Mirror
193nm deep ultraviolet UV reflective mirror is an optical filter specially designed for 193nm wavelength. Coligh specializes in the manufacturing of various UV mirrors
- Reflection wavelength 193nm
- Reflectivity 96.2%
- Multi-layer film design
193nm Deep UV Reflective Mirror Description
193nm deep ultraviolet mirrors are mainly used in scenes with high reflectivity and low absorption, and are widely used in lithography, ultraviolet spectroscopy, and laser systems (such as argon fluoride laser systems).
This mirror adopts a multi-layer interference film structure, and constructs a Bragg mirror by alternately depositing high and low refractive index materials (such as Al/MgF₂ or LaF₃/MgF₂). We achieve structural interference by precisely controlling the thickness and refractive index of each layer, and optimize the precise control of the number of film layers. The intensity of reflected light is greatly improved.
The reflectivity of this filter reaches 96.2%, which greatly reduces energy loss.
193nm Deep UV Reflective Mirror Technical Datesheet
| Parameter | Value |
| Operating Wavelength | 193 nm |
| Reflectivity | ≥ 99.5% |
| Material Composition | High-index: HfO₂, ZrO₂; Low-index: MgF₂, LiF |
| Substrate Material | UV-grade fused silica |
| Deposition Technique | Ion Beam Sputtering (IBS) with Plasma Assisted Deposition |
| Incident Angle | 0° – 5° (normal incidence) |
193nm Deep UV Reflective Mirror Applications
193nm Deep UV Reflective Mirror has profound applications in many fields that require high-precision light control, especially semiconductor lithography technology:
- Semiconductor lithography
The 193 nm DUV reflector is the core component of the ArF (argon fluoride) excimer laser lithography machine. The reflector evenly projects the 193 nm laser onto the photomask to ensure the uniformity and directionality of the light source. It is used to manufacture integrated circuit chips with a process of 7 nm to 180 nm. - Laser Cavities
In 193 nm ArF excimer lasers, the reflector is used to construct the laser resonant cavity, partially transmit, allow laser output, and ensure that the laser is reflected multiple times in the cavity to amplify the gain - Metrology & Inspection
In semiconductor manufacturing, 193 nm reflectors are used as high-precision inspection equipment for mask inspection, overlay metrology, and defect analysis
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