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365nm UV Anti Reflective Coatings Optical Filter
365nm UV Anti Reflective Coating filter is an optical filter designed to achieve high transmittance at 365nm wavelength. Coligh manufacturing EUV to infrared 3.0um anti-reflective filters
- Transmittance at 365nm is greater than 99.8%
- Reflectivity>0.3%
- 0-38 degree incident angle
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365nm UV Anti Reflective Coatings Optical Filter Description
The 365nm UV anti reflective coating filter uses multi-layer dielectric thin film interference technology and is specially designed for the efficient transmission and reflection suppression requirements of ultraviolet light.
- Through the precise multi-layer film design (such as SiO₂/Al₂O₃/HfO₂ stacking), it has ultra-high transmittance, with a transmittance of more than 99.8% at 360-370nm, and is compatible with mercury lamp i-line (365nm) and LED ultraviolet light sources.
- In addition, it has extremely low reflectivity, with a double-sided reflectivity of less than 0.3% at 360-370nm, which can significantly reduce ghosting and back reflections in the optical system.
- This filter is specially designed for angle insensitivity, supports 0°-38° large angle incidence, and is suitable for complex optical paths.
We support customization substrates such as fused quartz, CaF₂, sapphire, with a diameter of 5mm-1000mm, and the film system can be optimized according to customer needs.
365nm UV Anti Reflective Coatings Optical Filter Technical Datasheet
| Parameter | Specification |
| Central Wavelength | 365 nm |
| Peak Transmission | >99.8% |
| Reflectance | <0.3% (double-sided) |
| High transmission band (T>99.8%) | 360-370 nm |
| Incident Angle Tolerance | Reflectance fluctuation <0.3% (0°-38° incidence angle) |
| Substrate Material | Fused silica (optional: CaF₂/sapphire) |
| Surface Quality | 60-40, 40-20 (MIL-PRF-13830B) |
365nm UV Anti Reflective Coatings Optical Filter Applications
365nm UV Anti Reflective Coatings Optical Filter has typical applications in multiple scenarios.
- Semiconductor manufacturing
In i-line lithography machine lighting modules and mask defect detection optical systems, it can reduce the energy loss of 365nm light sources, improve lithography resolution and mask defect detection rate, and reduce wafer scrap rate. - Biomedicine
In flow cytometer UV excitation modules, DNA gel imaging systems and other business medical systems, it can reduce reflected stray light, reduce fluorescence signal background noise by 50%, and improve weak signal detection sensitivity. Support low-abundance biomarker analysis - Environmental monitoring
In ozone concentration sensors and water quality UV absorption detectors, it can improve detection accuracy
