Skip to content 
4.48nm Extreme Ultraviolet EUV Mirrors
4.48nm Extreme Ultraviolet (EUV) Flat Mirror is a mirror with high reflectivity at 4.48nm wavelength. Coligh manufactures EUV Mirrors with 4.48nm 6.67nm 13.5nm
- Ultra-short wavelength and high reflectivity
- Based on ion beam sputtering technology, using Fe Co Ni materials to enhance film stability
- Ultra-wide multi-layer film
4.48nm Extreme Ultraviolet EUV Flat Mirrors Description
The 4.48 nm Extreme Ultraviolet (EUV) Flat Mirror uses an alternating combination of iron, cobalt, and nickel, and is coated by ion beam sputtering with real-time film thickness monitoring to achieve a short-wave EUV 4.48nm >25% reflection and a low extinction coefficient.
- We have optimized the combination of materials, such as Fe Ni, to enhance the stability of the film.
- Our period thickness is controlled at 1.24nm. We have also achieved ultra-thin layer thickness (sub-nanometer level) and ultra-high period number through ion beam sputtering, maximizing optical performance while ensuring film adhesion.
4.48nm Extreme Ultraviolet EUV Mirrors Detail Display
4.48nm Extreme Ultraviolet EUV Flat Mirrors Technical Datasheet
| Material | Monocrystalline Silicon (Single Crystal Silicon) |
| Peak Reflective Wavelength | 4.48nm |
| Peak Reflectivity | >25% |
| Surface Quality | 60/40, 40/20, 20/10, 10/5 |
| Coating Process | Fe\Co\Ni Ultra-thin multilayer film coating |
4.48nm Extreme Ultraviolet EUV Mirrors Applications
The 4.48 nm Extreme Ultraviolet (EUV) mirror is a high-precision optical component designed for ultra-short wavelength EUV light. It is primarily used in fields such as ultra-high resolution imaging, extreme wavelength control, and cutting-edge scientific research. For example:
- Nanometer-scale microscopy systems: The high resolution of the 4.48 nm EUV mirror enables high-resolution imaging of cells and materials.
- Synchrotron radiation systems: The 4.48 nm EUV mirror is used for beam splitting, focusing, and adjusting beam trajectories.
- Solar observation: It captures 4–5 nm radiation emitted during solar flares and coronal mass ejections.
- Near the “water window” (2.3–4.4 nm): The 4.48 nm wavelength lies at the edge of the water window, allowing label-free nanoscopic imaging of water-containing biological samples, such as viruses and organelles.
Get Free Quote Of 4.48nm Extreme Ultraviolet EUV Mirrors
Related Products
Related News
At the 2025 Semicon China conference, Sicarrier, a Chinese company founded less than 4 years ago, released for the first […]
